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Murata Expands its Silicon Capacitor Production Line

9.3.2023
Reading Time: 2 mins read
A A

Murata is expanding its Silicon Capacitor manufacturing by creating a new 200-mm mass production line in Caen, France.

Murata will start to prepare this expansion from this April, and will create more than 100 new jobs in 2023–2025.

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The Silicon Capacitors manufactured by Murata in this factory are used in demanding applications such as implantable medical systems, telecommunication infrastructures, and mobile phones.

The new line will be based on 200 mm wafers, focusing on the PICS※1 latest technology, which has dramatically higher performance on electrical characteristic. These products will primarily target the mobile handset market with very high performances and capacitance values in super small sizes with thickness as low as 40 µm. 

※1:PICS stands for “Passive Integration Connective Substrate”    https://www.murata.com/en-global/support/faqs/capacitor/siliconcapacitors/other/0003

“Murata Silicon Capacitor technology is getting more and more traction, and has significantly grown outside demanding niche markets. Mobile phone architectures, as well as new electrical car systems, require lower and lower parasitic capabilities and very high performances in frequency and temperature.

These new applications also have challenging requirements in terms of space and volume”, Franck MURRAY says, Managing Director at Murata Integrated Passive Solutions in Caen. “This investment made by Murata group in our local factory, supported also by French and European Authorities, is a significant advancement in our growth, and another proof that our technology is delivering more and more value for our customers.”

The building for this new production line already exists and new equipment will be integrated in the coming weeks and months. A recruitment program has also started, with a plan to welcome more than 100 new employees during the next 3 years.

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Source: Murata

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a Schematic diagram of the BNT-based components constructed based on the entropy-increase strategy. b Digital photograph, cross-sectional SEM image, and EDS mappings of the MLCCs. c Unipolar P-E loops of MLCCs as a function of applied E. d Wrec and η of the MLCCs as a function of applied E. The comparison of (e) Wrec and η, (f) η and UF of the MLCCs with those of other recently reported state-of-the-art MLCCs. source: Nature Communications

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